Ionized sputtering with a pulsed hollow cathode magnetron
作者： Fred Fietzke , Bernd-Georg Krätzschmar
DOI: 10.1016/J.TSF.2014.07.060
关键词: Ion 、 Plasma 、 High-power impulse magnetron sputtering 、 Degree of ionization 、 Cathode 、 Ionization 、 Sputtering 、 Atomic physics 、 Materials science 、 Pulse duration
摘要: Abstract A hollow cathode magnetron has been operated with a HiPIMS power supply at duty cycles around 1%, and the non-reactive sputtering of several target materials such as copper, aluminum carbon investigated. Systematically varying pulse length, frequency, discharge voltage, pressure geometry magnetic field, waveforms voltage current have recorded. Beyond material-specific level, always shows runaway behavior stopped only densities above 10 A/cm2 due to limits supply. Furthermore, plasma characterized by time-averaged time-resolved optical emission spectroscopy well energy-resolved ion mass spectroscopy. The spectra showed contribution self-sputtering portion metal ions rising elapsing time during pulse. Measurement energy distribution functions different species mostly revealed low (below 30 eV) high (around 100 eV) part. Moreover, singly doubly charged is increased pulsed current. Deposited layers show dense, fine-grained structure, indicating degree ionization layer-forming particles.
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