In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool
作者： Liang Meng , Ramasamy Raju , Randolph Flauta , Hyungjoo Shin , David N. Ruzic
DOI: 10.1116/1.3271132
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摘要: Using a newly designed and built plasma diagnostic system, the parameters were investigated on commercial 200mm high-power hollow cathode magnetron (HCM) physical vapor deposition tool using Ta target under argon plasma. A three dimensional (3D) scanning radio frequency (rf)-compensated Langmuir probe was constructed to measure spatial distribution of electron temperature (Te) density (ne) in substrate region HCM at various input powers (2–15kW) pressures (10–70mTorr). The Te range 1–3eV, scaling with decreasing power pressure. Meanwhile, ne 4×1010–1×1012cm−3 increasing As metal deposits during measurements, self-cleaning cup installed chamber clean tungsten tip. However, its effectiveness recovering measured hindered by layer deposited insulating prob...
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