Plasma etching device and process
作者： Richard L Bersin , Michael J Singleton
DOI:
关键词: Quartz 、 Radio frequency energy 、 Aluminium 、 Plasma etching 、 Cylinder 、 Analytical chemistry 、 Optoelectronics 、 Electromagnetic coil 、 Materials science 、 Electrode 、 Process (computing)
摘要: There is disclosed a device for plasma etching which includes quartz cylinder surrounded by coil of electrodes connected to source radio frequency energy, and having within it concentric or perforated aluminum other electrically conductive metal.
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