Hollow anode plasma reactor and method
作者： Babak Kadkhodayan , David W. Benzing
DOI:
关键词:
摘要: The plasma processing apparatus includes a chamber, first electrode, second and containment device. device has plurality of slots is electrically coupled to the electrode. configured confine within an inter-electrode volume while facilitating maximum process gas flow. When generated by applying electric fields volume, confines without significantly restricting flow from volume.
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