Plasma etching apparatus utilizing plasma confinement
作者： Eric H. Lenz , Robert D. Dible
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摘要: Plasma etching apparatus includes a stack of quartz rings that are spaced apart to form slots therebetween and positioned surround an interaction space between two electrodes the where plasma is formed during operation apparatus. The dimensions chosen insure charged particles spent gases in exiting neutralized by wall collisions as they exit slots. Two voltage sources different frequencies used apply voltages fashion isolates each source from other.
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