Plasma confinement shield
作者： Joseph W. Buckfeller
DOI:
关键词:
摘要: Improvements of the shielding reactor chamber in a radio frequency (RF) are realized by providing dressed edges on apertures found shield. These improvements to lead decreased defect density processed wafers and eliminate need for frequent cleaning chamber.
lens.org 参考文章(4)
Wayne O. Duescher, Gary A. Staus, Mark J. Luedtke, Lapping apparatus and method for high speed lapping with a rotatable abrasive platen ,(1998)
Eugene Francis Bielby, Mark Douglas Richardson, David Michael Goffnett, Cleaning of cvd reactor used in the production of polycrystalline silicon ,(1992)
Jianming Fu, James Van Gogh, Sputter target for eliminating redeposition on the target sidewall ,(1998)
Miyazawa Hideaki, Katsura Toshimi, Soejima Yukio, Plasma processing apparatus ,(2000)