Low stress TiB2 coatings with improved tribological properties
作者： M Berger , L Karlsson , M Larsson , S Hogmark
DOI: 10.1016/S0040-6090(01)01481-X
关键词: Biasing 、 Elastic modulus 、 Substrate (electronics) 、 Materials science 、 Residual stress 、 Physical vapor deposition 、 Titanium diboride 、 Cavity magnetron 、 Sputter deposition 、 Composite material
摘要: Industrial use of physical vapour deposition TiB2 coatings has so far been strongly limited due to the very high compressive stresses normally possessed by these coatings. In this investigation it is shown that the residual stresses can be significantly reduced if the TiB2 coatings are deposited by magnetron sputtering utilising electrons to enhance adatom mobility on the growing film surface. This was done by switching the polarity of substrate bias from negative to positive. When the bias voltage changes from negative to positive the …
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