Laser-Induced Blistering of Thin SiO2 on Si
作者： Justin R. Serrano , David G. Cahill
DOI: 10.1080/10893950590945030
关键词: Silicon dioxide 、 Irradiation 、 Thin film 、 Materials science 、 Substrate (electronics) 、 Delamination 、 Ion 、 Composite material 、 Laser 、 Blisters
摘要: … with sub-nanosecond laser pulses at fluences above 0.65 J/cm 2 delaminate from the substrate. The volume of the blister created during the laser processing, determined through …
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