Conformal chemical beam deposition of thin metal film for fabricating high density trench capacitor cells
作者： David S. Y. Hsu , Henry F. Gray
DOI: 10.1063/1.110385
关键词: Optoelectronics 、 Chemical vapor deposition 、 Trench 、 Materials science 、 Nanotechnology 、 Scanning electron microscope 、 Deposition (phase transition) 、 Fabrication 、 Silicon 、 Thin film 、 Auger electron spectroscopy
摘要: … devoted to the capacitor in a DRAM cell, two approaches are … limited hy dielectric and metal deposition problems inside … enough to preclude making conformal film coatings by line-of-…
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