Etched surface gratings fabricated using computed interference between simulated optical signals and reduction lithography

作者: Christoph M. Greiner , Dmitri Iazikov , Thomas W. Mossberg

DOI:

关键词: Diffraction efficiencyInterference (wave propagation)LithographyPort (circuit theory)DiffractionMaterials scienceOptoelectronicsPhase (waves)SignalOpticsTrench

摘要: An optical apparatus comprises a set of diffractive elements on substrate. They are arranged: (i) to receive an input signal propagating from port as diffraction-guided beam, (ii) diffract portion the received output signal, (iii) route propagate and (iv) exhibit positional variation in amplitude, separation, or spatial phase over some set. The arrangement corresponds interference pattern derived computed at surface substrate between simulated design signals. Each element least one trench segment positioned along path defined by constant-phase contour pattern. is substantially rectangular trapezoidal transverse cross section.

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