Effect of microstructure on the mechanical properties of carbon nanofilms deposited on the Si(100) at high temperature under ultra high vacuum

摘要: Abstract Carbon nanofilms were deposited on the Si(100) wafers at substrate temperatures from room temperature (RT) to 700 °C by ultra-high-vacuum ion beam sputtering. The effect of evolution microstructure and mechanical properties carbon was investigated using Raman spectra, X-ray diffraction, scanning electron microscopy (SEM) nanoindentation. correlation between discussed. results showed that ID/IG ratio increased with RT 500 °C due graphitization more sp2 bonds then decreased 500 owing new SiC phase formation. In addition, C Si reaction found 600 °C an asymmetrical shift wavenumbers 900–1050 cm− 1 finished enhanced band as well no peak. A nanoweb-like morphology crystalline formation also observed surface film. both hardness Young's modulus films had similar trend microstructure. They 15.01 GPa 185.11 GPa RT, respectively, 4.50 GPa 60.53 GPa 500 °C, 32.53 GPa 200.82 GPa 700 °C. much are attributed morphology.