作者: M. Ghoranneviss , F. Yaghobian , M. Farbod , M. Eshghabadi
DOI: 10.1016/J.CAP.2008.08.046
关键词: Grain size 、 Annealing (metallurgy) 、 Metallurgy 、 Nanostructure 、 Nucleation 、 Materials science 、 Metal 、 Argon 、 Chemical engineering 、 Sputter deposition 、 Sputtering
摘要: Abstract We discuss about the controlled self-assembled synthesis of metallic Cu nanoparticles on different substrates such as glass, Al 2 O 3 and SiO at room temperature by dc magnetron sputtering technique. Deposits have been made using cylindrical target for a 2 m Torr Argon sputtering. After deposition, films were annealed oven 400 °C 10 min to induce nucleation growth nanoparticles. The average primary grain size materials thus synthesized could be proper choice process parameters (the pressure gas, applied power, substrate material, annealing time temperature). AFM SEM/EDX both characterize nanostructures in this study.