Anti-stiction coating for microelectromechanical devices
作者： Matthew G. Hankins , David R. Wheeler , Thomas M. Mayer
DOI:
关键词: Vacuum chamber 、 Silicon 、 Coating 、 Deposition (phase transition) 、 Nanotechnology 、 Materials science 、 Adhesion 、 Microelectromechanical systems 、 Silane 、 Chemical engineering 、 Stiction
摘要: A method for depositing an anti-stiction coating on a MEMS device comprises reacting the vapor of amino-functionalized silane precursor with silicon surface in vacuum chamber. The can further comprise cleaning to form clean hydroxylated prior surface. at least one atom, reactive amino (or imine) pendant, and hydrophobic pendant. is highly surface, thereby eliminating need post-process anneal step enabling reaction occur low pressure. Such vapor-phase deposition provides uniform morphology strong adhesion
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