Method for efficient coating of substrates including plasma cleaning and dehydration
作者： Kenneth M. Sautter , William A. Moffat
DOI:
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摘要: A process for the coating of substrates comprising insertion a substrate into oven, plasma cleaning substrate, rehydration dehydration withdrawal metered amount one or more chemicals from chemical reservoirs, vaporizing withdrawn in vapor chambers, and transfer vaporized thereby reacting with substrate. An apparatus gas generator, subsystem, vaporization subsystem.
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