作者: Tomoya Yamauchi , Shunsuke Kaifu , Yutaka Mori , Masato Kanasaki , Keiji Oda
DOI: 10.1016/J.RADMEAS.2012.04.013
关键词: Diphenyl ether 、 Mass spectrometry 、 Polyimide 、 Stopping power 、 Kapton 、 Isotropic etching 、 Materials science 、 Analytical chemistry 、 Etching 、 Ion
摘要: Abstract Track registration properties in polyimide films, KAPTON, for heavy ions have been examined by means of FT-IR spectrometry and the chemical etching sodium hypochlorite solution. The effective track core size loss C O C–N–C composing imide bonds, diphenyl ethers C–O–C evaluated under irradiations Ne, Fe Xe at energies less than 6 MeV/n. On other hand, property films has solution temperature 55 °C. Before etchings, were exposed to H, C, ions, incident below etch pits are found only on indicating significant difference pit between them. This implies that film charge or energy resolution these relatively ions. threshold level etchable is inferred be around 2500 keV/μm. radius this stopping power ether 1.6 nm, which equivalent length adjacent bonds chains. Breakings two radial direction latent tracks may produce KAPTON.