Wideband Dual-Gate GaN HEMT Low Noise Amplifier for Front-End Receiver Electronics

作者: Michael V. Aust , Arvind K. Sharma , Yao-chung Chen , Michael Wojtowicz

DOI: 10.1109/CSICS.2006.319921

关键词: AmplifierNoise figureY-factorElectrical engineeringOptoelectronicsDirect-coupled amplifierLow-noise amplifierNoise (electronics)Instrumentation amplifierMaterials scienceNoise temperature

摘要: A highly survivable wideband low noise amplifier (LNA) for front-end receiver electronics is presented utilizing 0.2 mum AlGaN/GaN HEMT process on SiC substrate. This novel utilizes dual-gate devices with current feedback and drain bias network to attain performance in terms of lower higher gain. Nominal operation at 125 mA/mm a voltage 10 volts provided 12.5 18 dB gain 1.3 2.5 figure. Due high breakdown voltage, the capable better than 25 dBm output power can withstand an input level approaching 38 dBm. paper will also document comparison similar circuit using 0.15 pseudomorphic InGaAs/AlGaAs/GaAs demonstrate outstanding survivability amplifiers

参考文章(4)
S. Cha, Y.H. Chung, M. Wojtowwiez, I. Smorchkova, B.R. Allen, J.M. Yang, R. Kagiwada, Wideband AlGaN/GaN HEMT low noise.amplifier for highly survivable receiver electronics 2004 IEEE MTT-S International Microwave Symposium Digest (IEEE Cat. No.04CH37535). ,vol. 2, pp. 829- 831 ,(2004) , 10.1109/MWSYM.2004.1339093
Hongtao Xu, C. Sanabria, A. Chini, S. Keller, U.K. Mishra, R.A. York, A C-band high-dynamic range GaN HEMT low-noise amplifier IEEE Microwave and Wireless Components Letters. ,vol. 14, pp. 262- 264 ,(2004) , 10.1109/LMWC.2004.828020
G.A. Ellis, Jeong-Sun Moon, D. Wong, M. Micovic, A. Kurdoghlian, P. Hashimoto, Ming Hu, Wideband AlGaN/GaN HEMT MMIC low noise amplifier international microwave symposium. ,vol. 1, pp. 153- 156 ,(2004) , 10.1109/MWSYM.2004.1335828
J.W. Palmour, S.T. Sheppard, R.P. Smith, S.T. Allen, W.L. Pribble, T.J. Smith, Z. Ring, J.J. Sumakeris, A.W. Saxler, J.W. Milligan, Wide bandgap semiconductor devices and MMICs for RF power applications international electron devices meeting. ,(2001) , 10.1109/IEDM.2001.979517