Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer.
作者： Joan K. Bosworth , Charles T. Black , Christopher K. Ober
DOI: 10.1021/NN900343U
关键词: Photoresist 、 Thin film 、 Copolymer 、 Polymer 、 Self-assembly 、 Wafer 、 Phase (matter) 、 Chemical engineering 、 Ultraviolet light 、 Materials science 、 Polymer chemistry
摘要: We leverage distinctive chemical properties of the diblock copolymer poly(α-methylstyrene)-block-poly(4-hydroxystyrene) to create for first time high-resolution selective-area regions two different block phase morphologies. Exposure thin films nonselective or block-selective solvent vapors results in polymer separation and self-assembly patterns cylindrical-phase kinetically trapped spherical-phases, respectively. Poly(4-hydroxystyrene) acts as a negative-tone photoresist presence small amounts photoacid generator cross-linker, undergoing radiation-induced cross-linking upon exposure ultraviolet light an electron beam. use lithographic lock one self-assembled morphology specific sample areas 100 nm width prior film subsequent vapor form second unexposed wafer areas.
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sci-hub.se 参考文章(31)
P. Mansky, T. P. Russell, C. J. Hawker, M. Pitsikalis, J. Mays, Ordered diblock copolymer films on random copolymer brushes Macromolecules. ,vol. 30, pp. 6810- 6813 ,(1997) , 10.1021/MA970675V
J. Y. Cheng, C. A. Ross, H. I. Smith, E. L. Thomas, Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up Advanced Materials. ,vol. 18, pp. 2505- 2521 ,(2006) , 10.1002/ADMA.200502651
Eungnak Han, Karl O. Stuen, Young-Hye La, Paul F. Nealey, Padma Gopalan, Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains Macromolecules. ,vol. 41, pp. 9090- 9097 ,(2008) , 10.1021/MA8018393
Soojin Park, Bokyung Kim, Ozgur Yavuzcetin, Mark T. Tuominen, Thomas P. Russell, Ordering of PS-b-P4VP on patterned silicon surfaces. ACS Nano. ,vol. 2, pp. 1363- 1370 ,(2008) , 10.1021/NN800073F
John M. Sebastian, Chiajen Lai, William W. Graessley, Richard A. Register, Steady-shear rheology of block copolymer melts and concentrated solutions: Disordering stress in body-centered-cubic systems Macromolecules. ,vol. 35, pp. 2707- 2713 ,(2002) , 10.1021/MA011523+
Young-Hye La, Erik W. Edwards, Sang-Min Park, Paul F. Nealey, Directed assembly of cylinder-forming block copolymer films and thermochemically induced cylinder to sphere transition: a hierarchical route to linear arrays of nanodots. Nano Letters. ,vol. 5, pp. 1379- 1384 ,(2005) , 10.1021/NL0506913
Charles T. Black, Polymer self-assembly as a novel extension to optical lithography. ACS Nano. ,vol. 1, pp. 147- 150 ,(2007) , 10.1021/NN7002663
Joan K. Bosworth, Marvin Y. Paik, Ricardo Ruiz, Evan L. Schwartz, Jenny Q. Huang, Albert W. Ko, Detlef-M. Smilgies, Charles T. Black, Christopher K. Ober, Control of self-assembly of lithographically patternable block copolymer films. ACS Nano. ,vol. 2, pp. 1396- 1402 ,(2008) , 10.1021/NN8001505
D. E. Angelescu, J. H. Waller, D. H. Adamson, P. Deshpande, S. Y. Chou, R. A. Register, P. M. Chaikin, Macroscopic Orientation of Block Copolymer Cylinders in Single‐Layer Films by Shearing Advanced Materials. ,vol. 16, pp. 1736- 1740 ,(2004) , 10.1002/ADMA.200400643
Violetta Olszowka, Volker Kuntermann, Alexander Böker, Control of Orientational Order in Block Copolymer Thin Films by Electric Fields: A Combinatorial Approach Macromolecules. ,vol. 41, pp. 5515- 5518 ,(2008) , 10.1021/MA800848B