Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films

作者: Jiyoung Jeong , Jeong Sook Ha , Sang-Soo Lee , Jeong Gon Son

DOI: 10.1002/MARC.201500088

关键词: OpticsSurface tensionDewettingPolystyreneAnnealing (metallurgy)PolydimethylsiloxaneThin filmWetted areaMaterials sciencePerpendicularComposite material

摘要: Highly ordered perpendicular orientation and straightly parallel coexisting polystyrene- block -polydimethylsiloxane (PS- b -PDMS) cylindrical microdomains with 10 nm width can be realized by using polyvinyl acetate as a partially dewetted topcoat solvent annealing acetone vapor. During annealing, the swelled begins to dewet dewetting rim sweeps surface of copolymer fi lms align direction propagation. However, wetted region topcoat/PS- -PDMS lm forms due reduced tension suffi cient concentration gradient in evaporation step. The orientational changes (perpendicular/straightly orientation) dewetted/wetted area are also investigated according vapor pressure annealing. degree directionality swept PS- distance from front, which is equivalent time after sweeping, examined. To control complex structures within specifi c area, an imprinting process introduced form topographical line– space patterns perpendicular/parallel BCP line–space patterns, respectively.

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