Hybrid line–dot nanopatterns from directed self-assembly of diblock copolymers by trenches

摘要: We demonstrate that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line–dot nanopatterns in addition a defect-free dot nanopattern. The formation line or thin films with proper surface affinities is controlled film thickness, which modulated topographic pattern consisting steps and trenches. Two kinds are achieved cylinder-forming sphere-forming copolymers, respectively. One kind composed perpendicularly standing cylinders (dots) on parallel monolayer (lines) within trenches, while dots other replaced spheres steps. thermodynamic stability region target identified constructing two-dimensional phase diagrams respect two control parameters step height thickness using self-consistent field theory. Furthermore, process window estimated cell dynamics simulations based time-dependent Ginzburg–Landau theory, confirming their feasibility kinetics.