Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates
作者： Sozaraj Rasappa , Lars Schulte , Dipu Borah , Hanna Hulkkonen , Sokol Ndoni
DOI: 10.1016/J.MEE.2018.02.002
关键词:
摘要: Abstract Cylinder-forming polystyrene- block -polydimethylsiloxane (PS- b -PDMS, 27.2k- -11.7k, SD39) copolymer having a total molecular weight of 39 kg mol −1 was exploited to achieve in-plane morphologies lines, dots and antidots. Brush-free self-assembly the SD39 on silicon substrates investigated using solvents that were PS or PDMS selective, neutral non-solvents based their Hansen solubility parameters. The different achieved with annealing times ranging from 10 min 1 h at room temperature. patterns used as an etch mask for transferring pattern into underlying substrate. Directed hierarchical directed templates confinement successfully demonstrated. strategy achieving multiple one BCP by mere choice unmodified provides simplified method surface nanopatterning, templated growth nanomaterials nanofabrication.
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