Simulation methods for solvent vapor annealing of block copolymer thin films

摘要: Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined context a self-consistent field theory framework. Key control variables determining final microdomain morphologies include swelling ratio or swollen volume fraction, thickness, substrate and atmosphere surface energies, effective Flory–Huggins interaction parameter. The regime studied where copolymer has high enough parameter that ordered structures form during are then trapped system through quenching. Both implicit explicit consideration considered to distinguish cases which leads non-bulk morphology. Block-selective solvents based on experimental systems polystyrene-b-polydimethylsiloxane annealed with toluene heptane. results these simulations compared experiments.