Solvent vapor annealed block copolymer films on organosilane self-assembled monolayers
作者： Adam W. Harant , Christopher N. Bowman
DOI: 10.1116/1.1978897
关键词:
摘要: Solvent vapor annealing is shown to be a useful technique for controlling the formation of poly(isoprene-b-styrene) (PI-b-PS) block copolymer thin film nanostructures. Annealing in methyl ethyl ketone (MEK) solvent yields hexagonal-type structure (78nm repeat distance), while toluene fingerprint texture. choice spin coating dramatically changes initial order these films: MEK provides hexagonal without annealing, disordered nanostructure. N-octadecyltriethoxysilane used form low surface energy self-assembled monolayer which effectively reduces pinning substrate, allowing development regions (∼1μm diameter) with high degree order. However, after several hours vapor, ultimately dewets from surface. Contact mode scanning probe microscopy has proven itself very tool imaging nanostructures, damaging films. ...
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