Surface morphology of PS-PDMS diblock copolymer films

作者: T.H Andersen , S Tougaard , N.B Larsen , K Almdal , I Johannsen

DOI: 10.1016/S0368-2048(01)00329-2

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摘要: Abstract Spin coated thin films (∼400 A) of poly(styrene)–poly(dimethylsiloxane) (PS–PDMS) diblock copolymers have been investigated using X-ray Photoelectron Spectroscopy and Atomic Force Microscopy. Surface segregation the poly(dimethylsiloxane) blocks was studied for five which ranged in molecular weight from 7 kg/mol to 500 kg/mol. The were annealed above below highest glass transition temperature two polymer but order–disorder temperature. Information concerning chemical in-depth distribution extracted by use peak shape analysis Spectra via Tougaard Method. amount dimethylsiloxane uppermost part quantified as a function annealing time For PS temperature, surface chain-ends occurs all PS–PDMS copolymers. At room takes place only when is small.

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