Aperture alignment in scatterometry metrology systems
作者： Nadav Carmel , Barak Bringoltz
DOI:
关键词: Highly sensitive 、 Overlay 、 Optics 、 Measure (physics) 、 Term (time) 、 Metrology 、 Optical axis 、 Engineering 、 Aperture 、 Calibration
摘要: Methods and algorithms are provided, as well new metrics for misalignment of apertures with respect to the optical axis a metrology system. The methods comprise aligning aperture(s) an scatterometry tool using correction term(s) derived by minimizing overlay variation measure calculated measurements periodic structure. These result in highly sensitive metrics, which may be used calibration stages or on fly align system's apertures, enable reducing target size due resulting enhanced alignment accuracy.
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