Overlay metrology and control method

作者： Mark Ghinovker , Boris Golovanevsky , Moshe Preil , Pavel Izikson , Elyakim Kassel

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摘要: An overlay method for determining the error of a device structure formed during semiconductor processing is disclosed. The includes producing calibration data that contains information relating first target at location to second given set process conditions. also production associated with structure. further correcting based on data.

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