Optical rule checking for detecting at risk structures for overlay issues
作者： William Brearley , Shayak Banerjee
DOI:
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摘要: A method and system is provided for detecting at risk structures due to mask overlay that occur during lithography processes. The can be implemented in a computer infrastructure having executable code tangibly embodied on readable storage medium programming instructions. instructions are operable obtain simulation of metal layer via, determine probability an arbitrary point (x, y) the covered by via calculating statistical coverage area metric followed mathematical approximations summing function.
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