Deprotonation of Poly(4-hydroxystyrene) Intermediates: Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist
作者： Kazumasa Okamoto , Ryo Matsuda , Hiroki Yamamoto , Takahiro Kozawa , Seiichi Tagawa
关键词: Lithography 、 Ionization 、 Radiolysis 、 Deprotonation 、 Extreme ultraviolet 、 Polymer 、 Photochemistry 、 Extreme ultraviolet lithography 、 Radical ion 、 Chemistry 、 General Engineering 、 General Physics and Astronomy
摘要: Poly (4-hydroxystyrene)(PHS) has been used in current lithography as a backbone polymer and is also a promising material for EUV and electron beam (EB) lithography. PHS is …
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jsap.jp参考文章(41)
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