The electrical properties of plasma-deposited thin films derived from pelargonium graveolens

摘要: Inherently volatile at atmospheric pressure and room temperature, plant-derived precursors present an interesting human-health-friendly precursor for the chemical vapour deposition of thin films. The electrical properties films derived from Pelargonium graveolens (geranium) were investigated in metal–insulator–metal (MIM) structures. Thin polymer-like deposited using plasma-enhanced synthesis under various plasma input power. J–V characteristics thus-fabricated MIM then studied order to determine direct current (DC) conduction mechanism polymer layers. It was found that capacitance plasma-deposited decreases low frequencies (C ≈ 10−11) remains a relatively constant value 10−10) high frequencies. These also have dielectric across wide range as RF power increases. conductivity determined be around 10−16–10−17 Ω−1 m−1, which is typical insulating materials. Richardson–Schottky might dominate charge transport higher field region geranium