作者: Mitsuhiro Hirano , Misao Yamane , Naofumi Ohtsu
DOI: 10.1016/J.APSUSC.2015.02.153
关键词: Chemical state 、 Materials science 、 Analytical chemistry 、 Titanium dioxide 、 Hydrogen 、 Titanium nitride 、 Oxygen 、 Tin 、 Titanium 、 X-ray photoelectron spectroscopy
摘要: Abstract In this study, we attempted to form titanium oxynitride (TiO x N y ) layers on (Ti) surfaces using direct-current (DC) plasmas generated from gas mixture comprising hydrogen, nitrogen, and oxygen. Additionally, the effect of ratio surface characteristics cell-adhesion performance was investigated. Scanning probe microscopy (SPM) images showed that plasma-treated were slightly rougher than untreated Ti surfaces, owing formation new layers. Chemical state analysis X-ray photoelectron spectroscopy (XPS) revealed comprised TiO , nitride (TiN), dioxide 2 ); concentrations TiN decreased increased with an increase in amount oxygen gas. An did not affect layer thickness, which approximately 25 nm. Furthermore, no differences cell morphology found between specimens treated various plasma gases. This is probably because treatment insufficiently improved hydrophilicity. Layers composed TiN, formed DC treatment; however, improve at initial stage after seeding.