A Load Balancing Method for Dedicated Photolithography Machine Constraint
作者： Arthur Shr , Alan Liu , Peter P Chen , None
DOI: 10.1007/978-0-387-36594-7_36
关键词: Semiconductor device fabrication 、 Scheduling (computing) 、 Photolithography 、 Distributed computing 、 Wafer 、 Computer science 、 Load balancing (computing)
摘要: The dedicated photolithography machine constraint in semiconductor manufacturing is one of the new issues machinery due to natural bias. In this paper, we propose heuristic Load Balancing (LB) scheduling approach based on a Resource Schedule and Execution Matrix (RSEM) tackle constraint. LB method schedule each wafer lot at first stage suitable machine, according load balancing factors among machines. We describe proposed present an example demonstrate result simulations validate approach.
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