MOCVD Routes to Thin Metal Oxide Films for superconducting electronics

作者: Douglas L. Schulz , Tobin J. Marks

DOI: 10.1002/ADMA.19940061003

关键词: MoleculeDielectricOptoelectronicsSuperlatticeMaterials scienceThin filmOxideChemical vapor depositionMineralogyHigh-temperature superconductivityMetalorganic vapour phase epitaxy

摘要:

参考文章(120)
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