Gas management system for a laser-produced-plasma euv light source

摘要: Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path system generating plasma at site, e.g. laser produced system, where the site be in fluid communication with path. For device, gas disposed include ion-stopping buffer and/or etchant. A pump provided to force through One or more heat exchangers removing from flowing provided. In some arrangements, filter used remove least portion target species