Imprint apparatus, method of manufacturing article and alignment apparatus
作者： Hiroshi Sato
DOI:
关键词: Detector 、 Field of view 、 Shot (pellet) 、 Controller (computing) 、 Engineering 、 Electrical engineering
摘要: The present invention provides an imprint apparatus comprising at least one first detector configured to detect a number of marks among plurality formed in the shot regions, second having field view wider than that detector, and different from marks, being larger number, controller align regions mold by using detection result detector.
lens.org 参考文章(19)
Philip D. Schumaker, Byung-Jin Choi, Pawan Kumar Nimmakayala, Alignment for edge field nano-imprinting ,(2009)
Hiroshi Sato, Mitsuru Hiura, Imprinting method, imprinting apparatus, and device manufacturing method ,(2014)
Yvonne Wendela Kruijt-Stegeman, Sander Frederik Wuister, Alignment and imprint lithography ,(2010)
Ken-ichiro Shinoda, Toshiki Iwai, Imprint apparatus, imprint method and method of manufacturing an article ,(2014)
Satoru Oishi, Hideki Ina, Yuichi Iwasaki, Lithography apparatus, and method of manufacturing article ,(2015)
Van Nguyen Truskett, Philip D. Schumaker, Daniel A. Babbs, Tom H. Rafferty, Byung-Jin Choi, Pawan Kumar Nimmakayala, Alireza Aghili, Interferometric analysis for the manufacture of nano-scale devices ,(2004)
Tai-Cherng Yu, Imprint mold and imprint molding method ,(2009)
Yoshiyuki Usui, Imprint apparatus, alignment method, and method of manufacturing article ,(2015)
Nozomu Hayashi, Exposure method, exposure apparatus, and method of manufacturing device ,(2009)
Akiyoshi Suzuki, Ken-ichiro Shinoda, Mitsuru Hiura, Imprint apparatus and method of manufacturing article ,(2013)