Lithography apparatus, and method of manufacturing article
作者： Satoru Oishi , Hideki Ina , Yuichi Iwasaki
DOI:
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摘要: The present invention provides a lithography apparatus including plurality of detectors each configured to detect mark on the substrate, and controller control patterning so that first operation second are alternately performed, irradiating substrate with beam while scan movement is performed in direction, performing step direction different from wherein cause, operation, at least one mark, arranged, an interval which positive integer multiple distance movement.
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