New line of high voltage high current pulse generators for plasma-based ion implantation

摘要: The two general specifications required for plasma-based ion implantation are low pressure, large size plasmas and high voltage current pulse generators. In addition, pulses with rise fall times of the order inverse plasma frequency much longer durations than those most often required. To fulfill these requirements, a new type generator using transformer has been developed. A “mettglass”® magnetic core is used as step-up transformer. Voltage at primary provided by transistor switches which can achieve less 1 μs maximum currents 100 A. consists 96 turns wired in parallel secondary series. performances reported this were obtained on test resistor then substrate immersed plasma.