Optical and structural differences between RF and DC AlxNy magnetron sputtered films
作者： V. Dumitru , C. Morosanu , V. Sandu , A. Stoica
DOI: 10.1016/S0040-6090(99)00726-9
关键词: Thin film 、 Sputtering 、 Mineralogy 、 Microstructure 、 Cavity magnetron 、 Nitrogen 、 Materials science 、 Optoelectronics 、 Crystal chemistry 、 Aluminium nitride 、 Argon
摘要: Abstract AlN films have been deposited by RF (1.78 MHz) and DC reactive magnetron sputtering (argon nitrogen) on glass substrates at low temperatures (
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