Influence of sputtering mechanisms on the preferred orientation of aluminum nitride thin films
作者： M. Clement , E. Iborra , J. Sangrador , A. Sanz-Hervás , L. Vergara
DOI: 10.1063/1.1587267
关键词:
摘要: … , microcrystals in the film tend to grow with the c axis along the surface normal. The energy … AlN films exhibiting pure (00.2) preferred orientation and rocking curves with a full width at …
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