Critical tensile and compressive strains for cracking of Al2O3 films grown by atomic layer deposition
作者： Shih-Hui Jen , Jacob A. Bertrand , Steven M. George
DOI: 10.1063/1.3567912
关键词: Polyethylene naphthalate 、 Compressive strength 、 Fracture toughness 、 Thin film 、 Materials science 、 Composite material 、 Ultimate tensile strength 、 Scanning electron microscope 、 Atomic layer deposition 、 Fracture mechanics
摘要: Al 2O3 atomic layer deposition (ALD) is a model ALD system and Al 2O3 ALD films are excellent gas diffusion barrier on polymers. However, little is known about the response of Al 2O3 ALD films to strain and the potential film cracking that would restrict the utility of gas diffusion barrier films. To understand the mechanical limitations of Al 2O3 ALD films, the critical strains at which the Al 2O3 ALD films will crack were determined for both tensile and compressive strains. The tensile strain measurements were obtained using a fluorescent …
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