作者: T. Stomeo , E. Di Fabrizio , D. Cojoc , M. De Vittorio , M. T. Todaro
DOI: 10.1016/J.MEE.2004.02.075
关键词: Plane wave 、 Lithography 、 Optics 、 Resist 、 Waveguide (optics) 、 Photolithography 、 Materials science 、 Plane wave expansion 、 Photonic crystal 、 Electron-beam lithography
摘要: We report on the direct electron-beam patterning of a negative tone resist SU8-2000 for fabrication two-dimensional photonic crystal (2D-PC) waveguide. The high refractive index (about 1.69), its transparency above 360 nm, good mechanical stability and possibility by lithography, make such ideal realization high-resolution waveguides. triangular array sub-micron pillars (lattice constant 300 nm filling factor 0.35) suitable 2D-PC waveguide glass substrate is reported. energy dispersion diagram, calculated plane wave expansion technique, shows that this structure has small band gap (PBG) TM-like modes.