作者: Daryl Sakaida , Howard Ge , Gabriel M. Kuhn , Henry C. Abbink
DOI:
关键词: Bond line 、 Optoelectronics 、 Wafer 、 Electronic engineering 、 Parasitic capacitance 、 Microelectromechanical systems 、 Water vapor 、 Materials science 、 Accelerometer
摘要: A method for optimizing direct wafer bond line width reduction of parasitic capacitance in a MEMS device by reducing the between first and second wafer, exposing to water vapor predetermined time period at temperature capable evaporating water, cooling freezing operating third determine if there is discontinuity during operation.