Low‐Temperature Deposition of Highly Textured Aluminum Nitride by Direct Current Magnetron Sputtering for Applications in Thin‐Film Resonators

作者: R. S. Naik , R. Reif , J. J. Lutsky , C. G. Sodini

DOI: 10.1149/1.1391664

关键词: OptoelectronicsThin filmPartial pressureSubstrate (electronics)Materials scienceDeposition (phase transition)NitrideSputter depositionDirect currentMineralogyCavity magnetron

摘要: … A direct current (dc) magnetron sputtering system was reconstructed to deposit high-quality, … Minimal stress control was possible with the dc magnetron source. © 1999 The …

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