Laser-plasma EUV source dedicated for surface processing of polymers
作者： A. Bartnik , H. Fiedorowicz , R. Jarocki , J. Kostecki , M. Szczurek
DOI: 10.1016/J.NIMA.2011.05.033
关键词: Extreme ultraviolet lithography 、 Plasma 、 Physics 、 Radiation 、 Ultra-high vacuum 、 Wavelength 、 Optoelectronics 、 Laser 、 Helium 、 Optics 、 Extreme ultraviolet
摘要: abstract In this work, a 10 Hz laser-plasma extreme ultraviolet (EUV) source built for surface processing ofpolymers is presented. The based on double-stream gas puff target created in vacuumchamber synchronously with the pumping laser pulse. formed by pulsed injection of Kr, Xeor KrXe mixture into hollow stream helium. EUV radiation focused using grazingincidence gold-plated ellipsoidal collector. Spectrum reflected consists narrowfeature intensity maximum at 10–11 nm wavelength and long-wavelength spectral tail up to70 nm. exact distribution depends applied plasma creation. To avoid strongabsorption residual present chamber during operation atwo step differential system was employed. allows polymer underrelatively high vacuum conditions (10 5 mbar) or reactive atmosphere. Polymer samples canbe irradiated focal plane collector some distance downstream plane. Thisway fluence beam can be regulated.& 2011 Elsevier B.V. All rights reserved.
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