Plasma-assisted heat treatment
作者： Satyendra Kumar , Devendra Kumar , Michael L. Dougherty
DOI:
关键词: Composite material 、 Plasma 、 Optics 、 Heat treating 、 Materials science
摘要: Methods and apparatus for plasma-assisted heat treatments are provided. The method can include initiating a treating plasma within cavity (14) by subjecting gas to electromagnetic radiation in the presence of catalyst (70), heating object exposing plasma, maintaining exposure sufficient period time alter at least one material property object.
lens.org参考文章(244)
Kenneth L. Smith, Highly canted retroreflective cube corner article ,(1997)
Rustum Roy, Dinesh Agrawal, Jiping Cheng, Shalva Gedevanishvili, Full sintering of powdered-metal bodies in a microwave field Nature. ,vol. 399, pp. 668- 670 ,(1999) , 10.1038/21390
Robert J. Lauf, Arvid C. Johnson, Robert J. Markunas, Don W. Bible, Apparatus and method for microwave processing of materials ,(1995)
E. Laurence Libelo, David E. Palaith, Method and apparatus for the microwave joining of ceramic items ,(1987)
Dinesh K. Agrawal, Rustum Roy, Jiping Cheng, Microwave processing in pure h fields and pure e fields ,(2000)
Ryuji Okamura, Hiroaki Niino, Masahiro Kanai, Tetsuya Takei, Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof ,(1994)
Alan B. Harker, Ira B. Goldberg, Diamond growth by microwave generated plasma flame ,(1992)
Chi C. Yang, James Kulman, Subhendu Guha, Jeffrey Fournier, Prem Nath, Stanford R. Ovshinsky, Vapor deposition of semiconductor material ,(1986)
Takashi Yunogami, Tatsumi Mizutani, Apparatus for and method of surface treatment for microelectronic devices ,(1990)
Philip Dr. Efthimion, Dennis John Helfritch, Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electro-magnetic waves ,(1988)