Apparatus for and method of surface treatment for microelectronic devices
作者： Takashi Yunogami , Tatsumi Mizutani
DOI:
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摘要: An apparatus for surface treatment according to the present invention used carrying out dry etching, thin film deposition and so forth is provided with a neutral beam etching in order improve rate. In an embodiment, microwave wave-guides forming duplex tube, discharge pair of solenoids arranged coaxially, multiaperture electrode extracting ion beam, gas supply pipes, set charged particle retarding grids, device controlling temperature specimen vacuum unit are provided.
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