作者: Akira Sakawaki , Masato Fukushima , Tomoo Shige
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摘要: An in-line film forming apparatus is provided which prevents uneven processing from occurring when reactive plasma treatment or ion irradiation performed on a substrate held by carrier. A carrier ( 25 ) includes holder 28 with hole 29 allows to be disposed therein, and plurality of supporting members 30 attached the periphery in an elastically deformable manner, capable detachably holding fitted into inside while outer peripheral portion made abut ). Within chamber performs ), ring member 32 having opening position corresponding so as face at least one surface both surfaces Negative potential applied grounded.