In-line film deposition system
作者： Yoshiki Aruga , Yo Kamikura
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摘要: An in-line film deposition system is adapted so that processing on a substrate completed through number of processes, while the length not excessive. A carrier 3 which holds two substrates 1, with their planar surfaces set parallel to transfer direction, sequentially transferred plurality vacuum chambers 2 arranged along polygonally-shaped path 30. Film continuously carried out 1 by means 4 are in form process chambers. rotation mechanism for rotating specified angle as direct subsequent transferring direction provided those located at turning points polygonal
lens.org 参考文章(20)
Takayuki Toyoda, Tadashi Kiriseko, Nobuhisa Shigemi, Noriko Soma, Hiromichi Tani, Continuous semiconductor substrate processing system ,(1989)
John Lester Hughes, Thomas Edward Shula, Carlos Ernesto Rodriguez, Dual track handling and processing system ,(1990)
Joseph D. Napoli, E. John Vowles, Joseph A. Maher, Modular vapor processor system ,(1989)
Issei Imahashi, Semiconductor processing system ,(1995)
Donald Rex Boys, Walter Edgar Graves, Disk or wafer handling and coating system ,(1983)
David C. Beckwith, Larry W. Sarner, Locking memory device ,(1993)
Mario Deligi, Senia Derbinsky, Spiral magnetic linear translating mechanism ,(1994)
Richard H. Rubin, Richard C. Heim, Scott M. Pawenski, Benjamin J. Petrone, Modular processing apparatus for processing semiconductor wafers ,(1987)
Paul David Teig, Mickey Lynn Canady, Gary James Johnson, Arthur Carl Wall, David Alvoid Edmonson, Method and apparatus for coating thin film data storage disks ,(1995)
Noriaki Chiba Chozairyo Kenkyujo Tani, Kyuzo Chiba Chozairyo Kenkyujo Nakamura, Masanori Chiba Chozairyo Kenkyujo Hashimoto, Yoshifumi Chiba Chozairyo Kenkyujo Ota, Kazuyuki Chiba Chozairyo Kenkyujo Ito, Michio Chiba Chozairyo Kenkyujo Ishikawa, Chemical vapor deposition apparatus of in-line type ,(1990)