Sub-micro a-C:H patterning of silicon surfaces assisted by atmospheric-pressure plasma-enhanced chemical vapor deposition

摘要: Micro and nano-patterning of surfaces is an increasingly popular challenge in the field miniaturization devices assembled via top-down approaches. This study demonstrates possibility depositing sub-micrometric localized coatings-spots, lines or even more complex shapes-made amorphous hydrogenated carbon (a-C:H) thanks to a moving XY stage. Deposition was performed on silicon substrates using chemical vapor deposition assisted by argon atmospheric-pressure plasma jet. Acetylene injected into post-discharge region as precursor means glass capillary with diameter. A parametric carried out influence geometric configurations (capillary diameter capillary-plasma distance) deposited coating. Thus, patterns formed were investigated scanning electron microscopy atomic force microscopy. Furthermore, composition large coated areas Fourier transform infrared spectroscopy according chosen atmospheric environment. The observed bonds show that reactions gaseous discharge both morphological stability after treatment are strongly dependent surrounding gas. Various a-C:H shapes successfully under controlled conditions inerting Overall, this new process micro-scale additive manufacturing offers unusually high-resolution at low cost.