Illumination device using a pulsed laser source a Schlieren optical system and a matrix addressable surface light modulator for producing images with undifracted light

摘要: An illumination device for producing models used manufacturing electronic elements, or direct of wafers substrates during the photolithographic steps required their production, structures including light-sensitive layers, comprises a pulsed laser light source and pattern generator. The generator includes an optical Schlieren system active, matrix-addressable surface modulator. lens arranged on side modulator, projection facing away from mirror which is between lenses directing coming onto reflective modulator at short distance relative to focal length lens. A filter in diffraction image plane virtual point lens, having structural design such nature that it will either out diffracted reflected by addressed areas undiffracted light. During displacement positioning table, model, disk, substrate structure are composed plurality partial images adequate addressing