Method to measure ion beam angle
作者： James David Bernstein
DOI:
关键词: Materials science 、 Substrate (printing) 、 Ion beam 、 Optics 、 Surface (mathematics) 、 Measure (physics) 、 Perpendicular
摘要: A device and method for measuring ion beam angle with respect to a substrate is disclosed. The includes forming plurality of shadowing structures extending substantially perpendicular from an upper surface the substrate, directing toward interrupting incident define implanted non-implanted portions substrate. further dose species within determining area as function implant, based on area, obtaining area.
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