作者: Peng Gu , Xinghua Zhu , Haihua Wu , Jitao Li , Dingyu Yang
DOI: 10.1016/J.JALLCOM.2018.11.283
关键词: Binding energy 、 Substrate (electronics) 、 Analytical chemistry 、 Photoluminescence 、 Responsivity 、 X-ray photoelectron spectroscopy 、 Materials science 、 Scanning electron microscope 、 Crystallite 、 Sputtering
摘要: Abstract In this paper, the effect of sputtering distance between target and substrate (DTS) on structural, morphological optical properties TiO2 films were investigated. X-ray diffraction (XRD) scanning electron microscopy (SEM) revealed that crystallite size surface morphology strongly dependent DTS. The photoelectron spectroscopy (XPS) results showed obvious three peaks including C1S, Ti2p O1s could be clearly observed binding energy was 285, 458 531 eV, respectively. For each sample, four near 386, 462, 527 595 nm in photoluminescence (PL) spectra originated from intrinsic recombination, F center, F+ center electrons transferred 3d Ti3+ states to deep levels OH−, Finally, photoresponse UV detectors based analyzed detector prepared at a DTS 80 mm high responsivity 2.02 × 10−4 A/W excellent photosensitivity 32.25, also, exhibited fast response with rise time (τr) 0.98 s fall (τf) 3.14 s.